Invention Grant
- Patent Title: Beam delivery for EUV lithography
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Application No.: US14648452Application Date: 2013-11-26
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Publication No.: US10289006B2Publication Date: 2019-05-14
- Inventor: Jan Bernard Plechelmus Van Schoot , Markus Franciscus Antonius Eurlings , Hermanus Johannes Maria Kreuwel
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- International Application: PCT/EP2013/074710 WO 20131126
- International Announcement: WO2014/095261 WO 20140626
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03F7/20 ; H05G2/00 ; G02B19/00 ; G02B27/09

Abstract:
A beam delivery apparatus is used with a laser produced plasma source. The beam delivery apparatus comprises variable zoom optics (550) operable to condition a beam of radiation so as to output a conditioned beam having a configurable beam diameter (b) and a plurality of mirrors (530a, 530b) operable to direct the conditioned beam of radiation to a plasma generation site. The beam delivery apparatus enables control of the axial position of the beam where the beam has a particular diameter, with respect to the beam's focus position (570). Also, a method is used to control the axial position of the location at a plasma generation site where a beam has a particular diameter, with respect to the beam's focus position.
Public/Granted literature
- US20150334813A1 Beam Delivery for EUV Lithography Public/Granted day:2015-11-19
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