Invention Grant
- Patent Title: ICP emission spectrophotometer
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Application No.: US15926097Application Date: 2018-03-20
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Publication No.: US10309903B2Publication Date: 2019-06-04
- Inventor: Yutaka Ikku
- Applicant: Hitachi High-Tech Science Corporation
- Applicant Address: JP Minato-ku, Tokyo
- Assignee: Hitachi High-Tech Science Corporation
- Current Assignee: Hitachi High-Tech Science Corporation
- Current Assignee Address: JP Minato-ku, Tokyo
- Agency: Banner & Witcoff, Ltd.
- Priority: JP2017-054491 20170321
- Main IPC: G01J3/30
- IPC: G01J3/30 ; G01N21/73 ; G01J3/443 ; G01J3/28 ; G01J3/18 ; G01N21/68 ; G01J3/02 ; G01J3/04

Abstract:
An ICP emission spectrophotometer includes an inductively coupled plasma device, a spectroscope, and a computer. The spectroscope includes an incidence window, an incidence side slit, a diffraction grating, an emission window, an emission side slit, and a detector. Measurement conditions including diffraction condition and a measurement result are displayed on a display device. In a case where there are a plurality of diffraction conditions each including a combination of a diffraction grating and a diffraction order for measuring desired diffracted light, comparison information including at least an intensity and a resolution of emitted light in the diffraction condition is displayed on the display device. A measurer selects diffraction conditions in which resolution is higher from among the diffraction conditions, and selects a diffraction condition in which an intensity is obtained from among the selected diffraction conditions.
Public/Granted literature
- US20180275069A1 ICP EMISSION SPECTROPHOTOMETER Public/Granted day:2018-09-27
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