Invention Grant
- Patent Title: Precursors for deposition of metal, metal nitride and metal oxide based films of transition metals
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Application No.: US15823755Application Date: 2017-11-28
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Publication No.: US10323054B2Publication Date: 2019-06-18
- Inventor: Benjamin Schmiege , Jeffrey W. Anthis , David Thompson
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: C07F15/06
- IPC: C07F15/06 ; C07F5/00 ; C07F15/04 ; C07F15/02

Abstract:
Metal coordination complexes comprising a metal atom coordinated to at least one aza-allyl ligand having the structure represented by: where each R1-R4 are independently selected from the group consisting of H, branched or unbranched C1-C6 alkyl, branched or unbranched C1-C6 alkenyl, branched or unbranched C1-C6 alkynyl, cycloalkyl groups having in the range of 1 to 6 carbon atoms, silyl groups and halogens. Methods of depositing a film using the metal coordination complex and a suitable reactant are also described.
Public/Granted literature
- US20180148466A1 Precursors For Deposition Of Metal, Metal Nitride And Metal Oxide Based Films Of Transition Metals Public/Granted day:2018-05-31
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