Invention Grant
- Patent Title: Methods for generating a mandrel mask
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Application No.: US15686955Application Date: 2017-08-25
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Publication No.: US10324369B2Publication Date: 2019-06-18
- Inventor: Tsung-Yu Wang , Nian-Fuh Cheng , Chia-Ping Chiang , Ming-Hui Chih , Wen-Chun Huang , Tsai-Sheng Gau
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: McDermott Will & Emery LLP
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G03F1/36 ; H01L21/308 ; H01L29/66

Abstract:
Embodiments of the present disclosure provide a method of generating mandrel patterns. A mandrel pattern is generated by constructing a boundary box, initiating a plurality of lead mandrels, and extending the lead mandrels across the boundary box. When a pattern region includes holes, portions of mandrels are removed from the holes after extension of the leading mandrels.
Public/Granted literature
- US20190064652A1 METHODS FOR GENERATING A MANDREL MASK Public/Granted day:2019-02-28
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