Invention Grant
- Patent Title: Semiconductor device fabricated by flux-free soldering
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Application No.: US15624026Application Date: 2017-06-15
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Publication No.: US10325838B2Publication Date: 2019-06-18
- Inventor: Abdul Rahman Mohamed , Chu Hua Goh
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Dicke, Billig & Czaja, PLLC
- Priority: DE102016111141 20160617
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L23/495

Abstract:
A method of fabricating a semiconductor device is disclosed. In one aspect, the method includes placing a first semiconductor chip on a carrier with the first main surface of the first semiconductor chip facing the carrier. A first layer of soft solder material is provided between the first main surface and the carrier. Heat is applied during placing so that a temperature at the first layer of soft solder material is equal to or higher than a melting temperature of the first layer of soft solder material. A second layer of soft solder material is provided between the first contact area and the second main surface. Heat is applied during placing so that a temperature at the second layer of soft solder material is equal to or higher than a melting temperature of the second layer of soft solder material. The first and second layers of soft solder material are cooled to solidify the soft solder materials.
Public/Granted literature
- US20170365544A1 SEMICONDUCTOR DEVICE FABRICATED BY FLUX-FREE SOLDERING Public/Granted day:2017-12-21
Information query
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