- 专利标题: Ultralow expansion titania-silica glass
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申请号: US15686313申请日: 2017-08-25
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公开(公告)号: US10329184B2公开(公告)日: 2019-06-25
- 发明人: Sezhian Annamalai , Carlos Alberto Duran , Kenneth Edward Hrdina , William Rogers Rosch
- 申请人: Corning Incorporated
- 申请人地址: US NY Corning
- 专利权人: Corning Incorporated
- 当前专利权人: Corning Incorporated
- 当前专利权人地址: US NY Corning
- 代理商 Kevin L. Bray
- 主分类号: C03C3/076
- IPC分类号: C03C3/076 ; C03B19/14 ; C03B25/00 ; C03B23/00 ; C03B19/12 ; C03C3/089 ; C03C3/112 ; C03C3/06 ; C03B25/02 ; C03C23/00
摘要:
Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.
公开/授权文献
- US20170349478A1 ULTRALOW EXPANSION TITANIA-SILICA GLASS 公开/授权日:2017-12-07
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