Invention Grant
- Patent Title: Position measurement system and lithographic apparatus
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Application No.: US15739824Application Date: 2016-05-26
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Publication No.: US10331045B2Publication Date: 2019-06-25
- Inventor: Engelbertus Antonius Fransiscus Van Der Pasch , Emiel Jozef Melanie Eussen , Robbert Edgar Van Leeuwen
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP15174594 20150630
- International Application: PCT/EP2016/061901 WO 20160526
- International Announcement: WO2017/001124 WO 20170105
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G01B9/02 ; G01B11/27

Abstract:
A position measurement system to measure a position of an object relative to a reference, the position measurement system including two interferometers, wherein each interferometer is configured to form a reference beam and a measurement beam from input radiation and to combine the reference beam and the measurement beam to provide output radiation to be delivered to a detector, wherein each interferometer is configured such that the reference beam is formed by reflection of input radiation from a reflective element, and such that the measurement beam is formed by diffraction of input radiation from a grating on the object, and wherein the reference beam and the measurement beam are parallel to each other.
Public/Granted literature
- US20180364594A1 POSITION MEASUREMENT SYSTEM AND LITHOGRAPHIC APPARATUS Public/Granted day:2018-12-20
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