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公开(公告)号：US12147167B2
公开(公告)日：2024-11-19
申请号：US15775602
申请日：2016-09-30
Applicant: ASML Netherlands B.V.
Inventor： Junichi Kanehara , Hans Butler , Paul Corné Henri De Wit , Engelbertus Antonius Fransiscus Van Der Pasch
Abstract: A method of operating a lithographic apparatus that comprises: a projection system configured to provide exposure radiation for patterning a substrate underneath the projection system; a first stage configured to support a first substrate; a second stage configured to support a second substrate; and a third stage accommodating a component that includes at least one of a sensor and a cleaning device; wherein the method comprises starting a pre-exposure scrum sweep operation after starting a substrate exchange operation; wherein during the pre-exposure scrum sweep operation, the third stage moves away from underneath the projection system while the second stage moves to underneath the projection system; wherein during the substrate exchange operation, the first substrate is unloaded from the first stage.
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公开(公告)号：US11914308B2
公开(公告)日：2024-02-27
申请号：US18123620
申请日：2023-03-20
Applicant: ASML NETHERLANDS B.V.
CPC classification number: G03F7/7085 , G03F7/70716 , G03F7/70725 , G03F7/70775 , G03F7/70808 , G03F9/70 , G03F9/7015 , G03F9/7019 , G03F9/7049 , G03F9/7084 , G03F9/7088 , G03F7/70633
Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
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公开(公告)号：US11476077B2
公开(公告)日：2022-10-18
申请号：US16840297
申请日：2020-04-03
Applicant: ASML Netherlands B.V.
Inventor： Marcel Koenraad Marie Baggen , Wouter Onno Pril , Engelbertus Antonius Fransiscus Van Der Pasch
IPC: H01J37/20 , H01J37/24 , H01J37/317 , H01J37/244
Abstract: A stage apparatus for an e-beam inspection apparatus comprising: an object table (3) comprising an supporting surface, the object table configured to support a substrate (190) on the supporting surface; a positioning device (180) configured to a position the object table; a position measurement system (5) comprising a position sensor (8-10) configured to measure a height position of the object table parallel to a first axis, the first axis being substantially perpendicular to the supporting surface, the position sensor comprising an interferometer measurement system having an interferometer sensor (9, 10, 22), wherein a measurement beam (11, 15) of the interferometer sensor is configured to irradiate a reflective surface (13, 17) of the object table in a measurement direction, the measurement direction having a first component parallel to the first axis and a second component parallel to a second axis, the second axis being substantially perpendicular to the first axis.
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公开(公告)号：US10976675B2
公开(公告)日：2021-04-13
申请号：US16774035
申请日：2020-01-28
Applicant: ASML NETHERLANDS B.V.
Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
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公开(公告)号：US11609503B2
公开(公告)日：2023-03-21
申请号：US17218420
申请日：2021-03-31
Applicant: ASML NETHERLANDS B.V.
Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
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Patent Agency Ranking
公开(公告)号：US10444635B2
公开(公告)日：2019-10-15
申请号：US16098350
申请日：2017-04-05
Applicant: ASML Netherlands B.V.
Inventor： Carolus Johannes Catharina Schoormans , Johannes Jacobus Matheus Baselmans , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Aldegonda Theodorus Marie Van Den Homberg , Maksym Yuriiovych Sladkov , Andreas Johannes Antonius Brouns , Alexander Viktorovych Padiy
Abstract: A lithographic method for measuring a position of a target grating with a mask sensor apparatus which comprises a plurality of detector modules each comprising a diffraction grating located at a mask side of a projection system of a lithographic apparatus and an associated detector, the method comprising a first step of measuring first intensities of a combination of diffraction orders diffracted from the target grating while the mask sensor apparatus is moved relatively to the target grating along a first direction; a second step of displacing the mask sensor apparatus relative to the target grating in a second direction, wherein a size of the relative displacement is proportional to a spatial frequency of a potential error; and a third step of measuring second intensities of the combination of diffraction orders diffracted from the target grating while the mask sensor apparatus is moved relatively to the target grating along the first direction.
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公开(公告)号：US10310392B2
公开(公告)日：2019-06-04
申请号：US15776995
申请日：2016-11-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans Butler , Johannes Petrus Martinus Bernardus Vermeulen , Engelbertus Antonius Fransiscus Van Der Pasch
IPC: G03F7/20
Abstract: A positioning device comprising an object table and a positioning module configured to position the object table. The positioning module comprises a first positioning module member configured to hold the object table, a second positioning module member configured to support the first positioning module member, and a support frame configured to support the second positioning module member. The positioning module also includes one or more actuators, a position measurement system configured to measure a position of the object table, and a control unit configured to control a position of the object table based on the measured position of the object table. The control unit is further configured to control a vertical position of the second position module member so as to maintain a top surface of the second positioning module member substantially parallel to a bottom surface of the first positioning module member.
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公开(公告)号：US10289011B2
公开(公告)日：2019-05-14
申请号：US15748644
申请日：2016-07-29
Applicant: ASML NETHERLANDS B.V.
Abstract: A position measurement system includes an interferometer to determine a position of an object. The interferometer is arranged to generate a first, second and third signals representative of the position by irradiating respective first, second and third areas of a reflective surface of the object. Along a line, the first and second areas are at a first distance relative to each other, the second and third areas are at a second distance relative to each other, and the first and third areas are at a third distance relative to each other. The interferometer is arranged to provide a rotation signal representative of a rotation of the object along an axis based on the first, second and third signals. The axis is parallel to the reflective surface and perpendicular to the line.
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公开(公告)号：US10216102B2
公开(公告)日：2019-02-26
申请号：US15894223
申请日：2018-02-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Jan Steven Christiaan Westerlaken , Gerardus Arnoldus Hendricus Franciscus Janssen , Peter Paul Steijaert , Engelbertus Antonius Fransiscus Van Der Pasch , Franciscus Van De Mast
IPC: G03F7/20
Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.
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公开(公告)号：US10209634B2
公开(公告)日：2019-02-19
申请号：US15547713
申请日：2016-01-26
Applicant: ASML Netherlands B.V.
Inventor： Hans Butler , Maurice Willem Jozef Etiënne Wijckmans , Engelbertus Antonius Fransiscus Van Der Pasch , Christiaan Alexander Hoogendam , Bernardus Antonius Johannes Luttikhuis
IPC: G03F7/20
Abstract: A lithographic apparatus comprising: a positioning stage (WT); an isolation frame (300); a projection system (PS), comprising a first frame (210); a second frame (220); a supporting frame (10) for supporting the positioning stage; a first vibration isolation system (250) and a second vibration isolation system (270), wherein the supporting frame and the first frame are coupled via the first vibration isolation system; a stage position measurement system (400) to determine directly the position of a stage reference of an element of the positioning stage in one or more degrees of freedom with respect to an isolation frame reference of an element of the isolation frame; and wherein the first frame and the isolation frame are coupled via the second vibration isolation system.
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