Invention Grant
- Patent Title: Three-dimensional semiconductor memory devices including stair structures and dummy electrodes
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Application No.: US15726002Application Date: 2017-10-05
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Publication No.: US10332611B2Publication Date: 2019-06-25
- Inventor: Kwang-Soo Kim , Heonkyu Lee
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-Do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2016-0175871 20161221
- Main IPC: G11C5/02
- IPC: G11C5/02 ; H01L27/115 ; G11C29/00 ; G11C11/34 ; G11C29/12 ; G11C29/48 ; G11C7/18

Abstract:
A three-dimensional semiconductor memory device including a substrate including a first connection region, a second connection region, and a cell array region disposed between the first and second connection regions. The memory device further includes an electrode structure including a plurality of electrodes vertically stacked on the substrate, wherein each of the electrodes has a pad exposed on the first connection region, and a dummy electrode structure disposed adjacent to the electrode structure and including a plurality of dummy electrodes vertically stacked on the substrate. Each dummy electrode has a dummy pad exposed on the second connection region. The electrode structure includes a first stair structure and a second stair structure which each includes the pads of the electrodes exposed on the first connection region. The first stair structure extends along a first direction, and the second stair structure extends along a second direction that crosses the first direction.
Public/Granted literature
- US20180174661A1 THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICES INCLUDING STAIR STRUCTURES AND DUMMY ELECTRODES Public/Granted day:2018-06-21
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