- 专利标题: Method for automatic calibration of a device for generative production of a three-dimensional object
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申请号: US14888969申请日: 2014-05-08
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公开(公告)号: US10336008B2公开(公告)日: 2019-07-02
- 发明人: Hans Perret , Jochen Philippi
- 申请人: EOS GmbH Electro Optical Systems
- 申请人地址: DE Krailling
- 专利权人: EOS GMBH ELECTRO OPTICAL SYSTEMS
- 当前专利权人: EOS GMBH ELECTRO OPTICAL SYSTEMS
- 当前专利权人地址: DE Krailling
- 代理机构: Seyfarth Shaw LLP
- 优先权: DE102013208651 20130510
- 国际申请: PCT/EP2014/059502 WO 20140508
- 国际公布: WO2014/180971 WO 20141113
- 主分类号: B29C64/393
- IPC分类号: B29C64/393 ; B29C67/00 ; G05B19/401 ; B22F3/105 ; B29C64/153 ; B29C64/386 ; B29C64/277 ; B33Y10/00 ; B33Y30/00 ; B33Y50/02 ; B29K105/00
摘要:
A method for automatically calibrating a device for generatively producing a three-dimensional object (8) comprises the following steps: irradiating an applied layer of a material (3) or a target by means of a first scanner (14) in order to produce a first test pattern (33) in the material (3) or the target; irradiating the applied layer of the material (3) or the target by means of a second scanner (15) in order to produce a second test pattern (34) in the material (3) or the target; detecting the first and second test patterns (33, 34) by means of a camera (24) and assigning the first and second test patterns (33, 34) to the first and second scanners (14, 15), respectively; comparing the first and/or the second test pattern (33, 34) with a reference pattern and/or comparing the first and second test patterns (33, 34) with one another; determining a first deviation of the first test pattern (33) from the reference pattern and/or a second deviation of the second test pattern (34) from the reference pattern and/or a relative deviation between the first test pattern (33) and the second test pattern (34); and calibrating the first and/or the second scanner (14, 15) in such a way that the first and/or the second deviation from the reference pattern and/or the relative deviation between the first test pattern (33) and the second test pattern (34) falls below a setpoint value.
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