Invention Grant
- Patent Title: Actuator system and lithographic apparatus
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Application No.: US16070848Application Date: 2017-01-30
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Publication No.: US10338483B2Publication Date: 2019-07-02
- Inventor: Robbert Edgar Van Leeuwen , Hans Butler
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP16157397 20160225
- International Application: PCT/EP2017/051877 WO 20170130
- International Announcement: WO2017/144236 WO 20170831
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L41/00 ; H01L41/02 ; H01L41/04 ; G01B9/02

Abstract:
An actuator system configured to position an object, the actuator system includes a piezo actuator having an actuator contact surface. The piezo actuator is configured to exert a force via the actuator contact surface onto the object. The piezo actuator includes a transparent piezo material. The actuator system further has an optical position sensor configured to measure a position of the actuator contact surface. The optical position sensor is configured to transmit an optical beam through the transparent piezo material to the actuator contact surface. The optical position sensor may form an interferometer.
Public/Granted literature
- US20190079416A1 ACTUATOR SYSTEM AND LITHOGRAPHIC APPARATUS Public/Granted day:2019-03-14
Information query
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