Invention Grant
- Patent Title: Material characterization from infrared radiation
-
Application No.: US15443751Application Date: 2017-02-27
-
Publication No.: US10354387B2Publication Date: 2019-07-16
- Inventor: Chia-Hsun Lee , Haowei Liu , Amit Shahar
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Jordan IP Law, LLC
- Main IPC: G06T7/11
- IPC: G06T7/11 ; H04N13/254 ; G06K9/20 ; G01S17/89 ; G01S17/46 ; G01S7/48 ; G06K9/62 ; G06K9/32

Abstract:
Systems, apparatuses, and/or methods to characterize a material. For example, and apparatus may include a pattern receiver to receive an IR pattern corresponding to non-uniform IR radiation that is to result from an interaction with a material, such as a translucent material. The apparatus may further include a characterizer to make a characterization of the material, such as a translucent material, based on the IR pattern. The characterization may differentiate the material, such as a translucent material, from one or more other materials, such as one or more other translucent materials.
Public/Granted literature
- US20180249095A1 MATERIAL CHARACTERIZATION FROM INFRARED RADIATION Public/Granted day:2018-08-30
Information query