Invention Grant
- Patent Title: Optical pattern projection
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Application No.: US15528239Application Date: 2015-11-11
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Publication No.: US10359637B2Publication Date: 2019-07-23
- Inventor: Markus Rossi
- Applicant: ams Sensors Singapore Pte. Ltd.
- Applicant Address: SG Singapore
- Assignee: ams Sensors Singapore Pte. Ltd.
- Current Assignee: ams Sensors Singapore Pte. Ltd.
- Current Assignee Address: SG Singapore
- Agency: Fish & Richardson P.C.
- International Application: PCT/SG2015/050444 WO 20151111
- International Announcement: WO2016/080908 WO 20160526
- Main IPC: G02B5/18
- IPC: G02B5/18 ; G02B27/00 ; G02B27/09 ; G02B27/22 ; G02B27/42 ; G02B27/44 ; H04N13/271

Abstract:
This disclosure describes optical systems for projecting an irregular or complex pattern onto a region of space (e.g., a two-dimensional or three-dimensional object or scene). A respective light beam is emitted from each of a plurality of light sources. The emitted light beams collectively are diffracted in accordance with a plurality of different first grating parameters to produce a plurality of first diffracted light beams. The first diffracted light beams then collectively are diffracted in accordance with one or more second grating parameters.
Public/Granted literature
- US20170322424A1 OPTICAL PATTERN PROJECTION Public/Granted day:2017-11-09
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