Invention Grant
- Patent Title: Radiation system and optical device
-
Application No.: US15766225Application Date: 2016-10-25
-
Publication No.: US10359710B2Publication Date: 2019-07-23
- Inventor: Hendrikus Gijsbertus Schimmel , Jeroen Marcel Huijbregtse , Maarten Van Kampen , Pieter-Jan Van Zwol
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP15193999 20151111
- International Application: PCT/EP2016/075655 WO 20161025
- International Announcement: WO2017/080817 WO 20170518
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H05G2/00 ; G21K1/06

Abstract:
A radiation system comprises a fuel emitter configured to provide fuel to a plasma formation region, a laser arranged to provide a laser beam at the plasma formation region incident on the fuel to generate a radiation emitting plasma, and a reflective or transmissive device (30) arranged to receive radiation emitted by the plasma and to reflect or transmit at least some of the received radiation along a desired path, wherein the reflective or transmissive device comprises a body configured to reflect and/or transmit said at least some of the radiation, and selected secondary electron emission (SEE) material (34) arranged relative to the body such as to emit secondary electrons in response to the received radiation, thereby to clean material from a surface of the device.
Public/Granted literature
- US20180307146A1 A Radiation System and Optical Device Public/Granted day:2018-10-25
Information query
IPC分类: