Vertical channel transistors fabrication process by selective subtraction of a regular grid

Invention Grant

US10361090B2 Vertical channel transistors fabrication process by selective subtraction of a regular grid 有权

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Patent Title: Vertical channel transistors fabrication process by selective subtraction of a regular grid
Application No.: US15120720

Application Date: 2014-09-24
Publication No.: US10361090B2

Publication Date: 2019-07-23
Inventor: Kimin Jun , Patrick Morrow , Donald Nelson
Applicant: INTEL CORPORATION
Applicant Address: US CA Santa Clara
Assignee: Intel Corporation
Current Assignee: Intel Corporation
Current Assignee Address: US CA Santa Clara
Agency: Schwabe, Williamson & Wyatt, P.C.
International Application: PCT/US2014/057257 WO 20140924
International Announcement: WO2015/191096 WO 20151217
Main IPC: H01L21/308
IPC: H01L21/308 ; H01L29/66 ; H01L29/78 ; H01L21/768 ; H01L29/06

Vertical channel transistors fabrication process by selective subtraction of a regular grid

Abstract:

A grid comprising a first set of grid lines and a second set of grid lines is formed on a substrate using a first lithography process. At least one of the first set of grid lines and the second set of grid lines are selectively patterned to define a vertical device feature using a second lithography process.

Public/Granted literature

US20170011929A1 VERTICAL CHANNEL TRANSISTORS FABRICATION PROCESS BY SELECTIVE SUBTRACTION OF A REGULAR GRID Public/Granted day:2017-01-12

Information query

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IPC分类:

H	电学
H01	基本电气元件
H01L	半导体器件；其他类目中不包括的电固体器件（使用半导体器件的测量入G01；一般电阻器入H01C；磁体、电感器、变压器入H01F；一般电容器入H01G；电解型器件入H01G9/00；电池组、蓄电池入H01M；波导管、谐振器或波导型线路入H01P；线路连接器、汇流器入H01R；受激发射器件入H01S；机电谐振器入H03H；扬声器、送话器、留声机拾音器或类似的声机电传感器入H04R；一般电光源入H05B；印刷电路、混合电路、电设备的外壳或结构零部件、电气元件的组件的制造入H05K；在具有特殊应用的电路中使用的半导体器件见应用相关的小类）
H01L21/00	专门适用于制造或处理半导体或固体器件或其部件的方法或设备
H01L21/02	.半导体器件或其部件的制造或处理
H01L21/04	..至少具有一个跃变势垒或表面势垒的器件，例如PN结、耗尽层、载体集结层
H01L21/18	...器件有由周期表Ⅳ族元素或含有/不含有杂质的AⅢBⅤ族化合物构成的半导体，如掺杂材料
H01L21/30	....用H01L21/20至H01L21/26各组不包含的方法或设备处理半导体材料的（在半导体材料上制作电极的入H01L21/28）
H01L21/302	.....改变半导体材料的表面物理特性或形状的，例如腐蚀、抛光、切割
H01L21/306	......化学或电处理，例如电解腐蚀（形成绝缘层的入H01L21/31；绝缘层的后处理入H01L21/3105）
H01L21/308	.......应用掩膜的（H01L21/3063，H01L21/3065优先）