- 专利标题: Passivation glasses for semiconductor devices
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申请号: US16075796申请日: 2017-05-03
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公开(公告)号: US10370290B2公开(公告)日: 2019-08-06
- 发明人: Srinivasan Sridharan , John J. Maloney , George E. Sakoske , Gregory R. Prinzbach , David Widlewski , Jackie Davis , Bradford Smith
- 申请人: Ferro Corporation
- 申请人地址: US OH Mayfield Heights
- 专利权人: Ferro Corporation
- 当前专利权人: Ferro Corporation
- 当前专利权人地址: US OH Mayfield Heights
- 代理机构: Rankin, Hill & Clark LLP
- 国际申请: PCT/US2017/030788 WO 20170503
- 国际公布: WO2018/026402 WO 20180208
- 主分类号: H01L21/02
- IPC分类号: H01L21/02 ; C03C4/16 ; C03C3/066 ; C03C8/24 ; H01L23/29 ; H01L23/31 ; C03C3/062 ; C03C3/108 ; C03C3/072 ; C03C8/04 ; C03C8/10 ; C03C8/22
摘要:
A passivation glass coating composition is provided for forming a fired passivation glass layer on a semiconductor substrate having p-n junction. The passivation glass coating composition includes a glass component that is lead free, cadmium free, alkali metal oxides free, and colored transition metal oxides (i.e. metal oxides of V, Fe, Co, Ni, Cr, Cu, Mn) free. The glass component includes bismuth based glasses, and provides a firing temperature range of 500° C. to 900° C., and controlled devitrification. Once fired to a semiconductor device, the fired passivation glass layer provides exceptional device performance including no cracking of the fired passivation glass layer, excellent thermal expansion matching to silicon, good chemical resistance to acid and base, and improved device performance.
公开/授权文献
- US20190055155A1 Passivation Glasses For Semiconductor Devices 公开/授权日:2019-02-21