Invention Grant
- Patent Title: Placement of carbon nanotube guided by DSA patterning
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Application No.: US16247326Application Date: 2019-01-14
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Publication No.: US10374179B2Publication Date: 2019-08-06
- Inventor: Ali Afzali-Ardakani , Sarunya Bangsaruntip , Shu-Jen Han , HsinYu Tsai
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Michael J. Chang, LLC
- Agent L. Jeffrey Kelly
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L51/05 ; H01L51/00

Abstract:
In one aspect, a method for placing carbon nanotubes on a dielectric includes: using DSA of a block copolymer to create a pattern in the placement guide layer on the dielectric which includes multiple trenches in the placement guide layer, wherein there is a first charge on sidewall and top surfaces of the trenches and a second charge on bottom surfaces of the trenches, and wherein the first charge is different from the second charge; and depositing a carbon nanotube solution onto the dielectric, wherein self-assembly of the deposited carbon nanotubes within the trenches occurs based on i) attractive forces between the first charge on the surfaces of the carbon nanotubes and the second charge on the bottom surfaces of the trenches and ii) repulsive forces between the first charge on the surfaces of the carbon nanotubes and the first charge on sidewall and top surfaces of the trenches.
Public/Granted literature
- US20190165289A1 Placement of Carbon Nanotube Guided by DSA Patterning Public/Granted day:2019-05-30
Information query
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