Invention Grant
- Patent Title: Lithography system, method and computer program product for hierarchical representation of two-dimensional or three-dimensional shapes
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Application No.: US15270150Application Date: 2016-09-20
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Publication No.: US10379446B2Publication Date: 2019-08-13
- Inventor: Alok Verma , Sinatra Canggih Kho , Adriaan Johan Van Leest
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP15187192 20150928
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G06F9/00 ; G03F9/00
Abstract:
This disclosure includes a variety of methods of describing a shape in a hierarchical manner, and uses of such a hierarchical description. In particular, this disclosure includes a method comprising: fitting one or more sub-shapes of a first order against a shape; determining an error of the fitting; and fitting one or more sub-shapes of a second order against the error.
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