Patent search ap:("ASML Netherlands B.V.") AND inv:"Sinatra Canggih Kho" Page 1

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发明授权
Lithography system, method and computer program product for hierarchical representation of two-dimensional or three-dimensional shapes 有权

公开(公告)号：US10379446B2

公开(公告)日：2019-08-13

申请号：US15270150

申请日：2016-09-20

Applicant: ASML Netherlands B.V.

Inventor： Alok Verma , Sinatra Canggih Kho , Adriaan Johan Van Leest

IPC: G03F7/20 , G06F9/00 , G03F9/00

Abstract: This disclosure includes a variety of methods of describing a shape in a hierarchical manner, and uses of such a hierarchical description. In particular, this disclosure includes a method comprising: fitting one or more sub-shapes of a first order against a shape; determining an error of the fitting; and fitting one or more sub-shapes of a second order against the error.

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