Invention Grant
- Patent Title: Field effect transistor and method of making
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Application No.: US15840622Application Date: 2017-12-13
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Publication No.: US10381447B2Publication Date: 2019-08-13
- Inventor: Lukas Frederik Tiemeijer , Viet Thanh Dinh , Valerie Marthe Girault
- Applicant: NXP B.V.
- Applicant Address: NL Eindhoven
- Assignee: NXP B.V.
- Current Assignee: NXP B.V.
- Current Assignee Address: NL Eindhoven
- Main IPC: H01L29/40
- IPC: H01L29/40 ; H01L29/417 ; H01L23/66 ; H01L23/528 ; H01L29/423 ; H01L23/522 ; H01L29/78 ; H01L27/02

Abstract:
A Field Effect Transistor (FET) capable of operating at high frequencies and includes comb-shaped source and drain electrodes. The comb-shaped drain electrode includes a plurality of thin comb-shape drain electrode layers at corresponding levels of the FET, each comb-shaped drain electrode layer including a plurality of drain electrode fingers having substantially the same width as the comb-shaped drain electrodes of each other layer. The comb-shaped source electrode includes a plurality of comb-shape source electrode layers at the corresponding levels, each comb-shaped drain electrode layer including a plurality of drain electrode fingers having substantially the same width as the comb-shaped source electrodes of each other layer. In addition, the inter-level retraction of adjacent drain electrode layers is the same or substantially the same. Similarly, the inter-level retraction of adjacent source electrode layers is the same or substantially the same.
Public/Granted literature
- US20190181234A1 FIELD EFFECT TRANSISTOR AND METHOD OF MAKING Public/Granted day:2019-06-13
Information query
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