Invention Grant
- Patent Title: Lithographic apparatus
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Application No.: US16326410Application Date: 2017-07-28
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Publication No.: US10394140B2Publication Date: 2019-08-27
- Inventor: Hendrikus Herman Marie Cox , Paul Corné Henri De Wit , Arie Jeffrey Den Boef , Adrianus Hendrik Koevoets , Jim Vincent Overkamp , Frits Van Der Meulen , Jacobus Cornelis Gerardus Van Der Sanden
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP16186948 20160902
- International Application: PCT/EP2017/069104 WO 20170728
- International Announcement: WO2018/041491 WO 20180308
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A lithographic apparatus comprises a projection system which is configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table. The lithographic apparatus further comprises a heating apparatus comprises one or more radiation sources configured to provide additional radiation beams which illuminate and heat part of the substrate during the exposure.
Public/Granted literature
- US20190187573A1 Lithographic Apparatus Public/Granted day:2019-06-20
Information query
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