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公开(公告)号：US10747125B2
公开(公告)日：2020-08-18
申请号：US16177585
申请日：2018-11-01
发明人： Raymond Wilhelmus Louis Lafarre , Adrianus Hendrik Koevoets , Sjoerd Nicolaas Lambertus Donders , Menno Fien , Antonius Franciscus Johannes De Groot , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Martijn Houben , Jan Steven Christiaan Westerlaken , Jim Vincent Overkamp , Maarten Van Beijnum
IPC分类号： G03F7/20
摘要： A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.
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公开(公告)号：US20140340659A1
公开(公告)日：2014-11-20
申请号：US14375457
申请日：2013-01-25
发明人： Jan Bernard Plechelmus Van Schoot , Adrianus Hendrik Koevoets , Theodorus Petrus Maria Cadee , Sjoerd Nicolaas Lambertus Donders , Koen Jacobus Johannes Maria Zaal
IPC分类号： G03F7/20
CPC分类号： G03F7/70891 , G03F7/70266 , G03F7/70775 , G03F7/70833 , G03F7/7085 , G03F7/70858
摘要： A lithographic apparatus component, such as a metrology system or an optical element (e.g., a mirror) is provided with a temperature control system for controlling deformation of the component. The control system includes channels provided close to a surface of the component through which a two phase cooling medium is supplied. The metrology system measures a position of at least a moveable item with respect to a reference position and includes a metrology frame connected to the reference position. An encoder is connected to the moveable item and constructed and arranged to measure a relative position of the encoder with respect to a reference grid. The reference grid may be provided directly on a surface of the metrology frame. A lithographic projection apparatus may have the metrology system for measuring a position of the substrate table with respect to the projection system.
摘要翻译： 光刻设备部件如测量系统或光学元件（例如，反射镜）设置有用于控制部件变形的温度控制系统。 控制系统包括靠近组件的表面设置的通道，通过该通道提供两相冷却介质。 计量系统测量相对于参考位置的至少可移动项目的位置，并且包括连接到参考位置的计量框架。 编码器连接到可移动项目，并被构造和布置成测量编码器相对于参考网格的相对位置。 参考网格可以直接设置在计量框架的表面上。 平版印刷设备可以具有用于测量衬底台相对于投影系统的位置的计量系统。
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公开(公告)号：US11740566B2
公开(公告)日：2023-08-29
申请号：US17790986
申请日：2020-12-16
IPC分类号： G03F7/20 , H01L21/687 , G03F7/00
CPC分类号： G03F7/7095 , G03F7/707 , G03F7/70783 , H01L21/6875
摘要： A substrate with a backside surface configured to provide a friction switch when the substrate is loaded onto a substrate holder in a substrate-loading cycle, wherein the substrate backside surface has a molecular assembly including at least one high-interaction region and at least one low-interaction region. Further, there is provided methods using such a substrate and methods for creating such a substrate.
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公开(公告)号：US11231657B2
公开(公告)日：2022-01-25
申请号：US16625135
申请日：2018-06-07
发明人： Adrianus Hendrik Koevoets , Cornelis Adrianus De Meijere , Willem Michiel De Rapper , Sjoerd Nicolaas Lambertus Donders , Jan Groenewold , Alain Louis Claude Leroux , Maxim Aleksandrovich Nasalevich , Andrey Nikipelov , Johannes Adrianus Cornelis Maria Pijnenburg , Jacobus Cornelis Gerardus Van Der Sanden
IPC分类号： G03F7/20
摘要： A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate, a cooling apparatus located in use above the substrate adjacent to the exposure area, the cooling apparatus being configured to remove heat from the substrate during use, a plasma vessel located below the cooling apparatus with its opening facing towards the cooling apparatus, and a gas supply for supplying gas to the plasma vessel and an aperture for receipt of a radiation beam. In use, supplied gas and a received radiation beam react to form a plasma within the plasma vessel that is directed towards a surface of the cooling apparatus which faces the opening of the plasma vessel.
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公开(公告)号：US10416574B2
公开(公告)日：2019-09-17
申请号：US15568122
申请日：2016-04-04
发明人： Adrianus Hendrik Koevoets , Sander Catharina Reinier Derks , Franciscus Johannes Joseph Janssen , Jim Vincent Overkamp , Jacobus Cornelis Gerardus Van Der Sanden
IPC分类号： G03B27/52 , G03F7/20 , H01L21/67 , H01L21/683
摘要： A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus (40) for cooling the substrate, wherein the cooling apparatus comprises a cooling element (42, 44) located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
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公开(公告)号：US20170090304A1
公开(公告)日：2017-03-30
申请号：US15297001
申请日：2016-10-18
发明人： Raymond Wilhelmus Louis Lafarre , Adrianus Hendrik Koevoets , Sjoerd Nicolaas Lambertus Donders , Menno Fien , Antonius Franciscus Johanne De Groot , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Martijn Houben , Jan Steven Christiaan Westerlaken , Jim Vincent Overkamp , Maarten Van Beijnum
IPC分类号： G03F7/20
CPC分类号： G03F7/70716 , G03F7/70341 , G03F7/707 , G03F7/70733
摘要： A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.
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公开(公告)号：US20160195823A1
公开(公告)日：2016-07-07
申请号：US15046284
申请日：2016-02-17
发明人： Yvonne Wendela KRUIJT-STEGEMAN , Andre Bernardus Jeunink , Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Frederik Dijksman , Carolus Johannes Catharina Schoormans , Adrianus Hendrik Koevoets , Catharinus De Schiffart , Sander Frederik Wuister
摘要： An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.
摘要翻译： 公开了一种压印光刻设备，其包括布置成保持压印模板的压印模板保持器和被配置为测量压印模板的尺寸和/或形状的变化的多个位置传感器，其中位置传感器与 印记模板 还公开了一种光刻方法，其包括使用压印模板将图案印刷到基板上，以及在将图案压印到基板上的同时测量压印模板的尺寸和/或形状的变化。
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公开(公告)号：US20240264540A1
公开(公告)日：2024-08-08
申请号：US18565964
申请日：2022-06-15
IPC分类号： G03F7/00 , H01L21/67 , H01L21/683
CPC分类号： G03F7/70708 , G03F7/70033 , G03F7/70758 , G03F7/70775 , G03F7/70783 , G03F7/70841 , G03F7/7085 , G03F7/70875 , H01L21/67109 , H01L21/67248 , H01L21/6831 , H01L21/6838
摘要： A substrate holder for holding a substrate comprising a frame and a surface clamping device arranged on an underside of the frame configured to electrostatically attract an upper surface of the substrate from above the substrate. The substrate holder can be used to contactlessly hold and deform the substrate and thereby control a shape of the substrate. The substrate holder is suitable for use in a semiconductor processing apparatus and can operate in a vacuum or near-vacuum environment, such as in an EUV lithographic apparatus.
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公开(公告)号：US11287752B2
公开(公告)日：2022-03-29
申请号：US16625135
申请日：2018-06-07
发明人： Adrianus Hendrik Koevoets , Cornelis Adrianus De Meijere , Willem Michiel De Rapper , Sjoerd Nicolaas Lambertus Donders , Jan Groenewold , Alain Louis Claude Leroux , Maxim Aleksandrovich Nasalevich , Andrey Nikipelov , Johannes Adrianus Cornelis Maria Pijnenburg , Jacobus Cornelis Gerardus Van Der Sanden
IPC分类号： G03F7/20
摘要： A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate, a cooling apparatus located in use above the substrate adjacent to the exposure area, the cooling apparatus being configured to remove heat from the substrate during use, a plasma vessel located below the cooling apparatus with its opening facing towards the cooling apparatus, and a gas supply for supplying gas to the plasma vessel and an aperture for receipt of a radiation beam. In use, supplied gas and a received radiation beam react to form a plasma within the plasma vessel that is directed towards a surface of the cooling apparatus which faces the opening of the plasma vessel.
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10.发明授权公开(公告)号：US10955595B2
公开(公告)日：2021-03-23
申请号：US16072399
申请日：2017-02-17
摘要： A reflector for EUV radiation, the reflector comprising a reflector substrate and a reflective surface, the reflector substrate having a plurality of coolant channels formed therein, the coolant channels being substantially straight, substantially parallel to each other and substantially parallel to the reflective surface and configured so that coolant flows in parallel through the coolant channels and in contact with the reflector substrate.
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