Invention Grant
- Patent Title: Apparatus of plural charged-particle beams
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Application No.: US15216258Application Date: 2016-07-21
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Publication No.: US10395886B2Publication Date: 2019-08-27
- Inventor: Weiming Ren , Xuedong Liu , Xuerang Hu , Zhongwei Chen
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Main IPC: H01J37/14
- IPC: H01J37/14 ; H01J37/147 ; H01J37/06 ; H01J37/10 ; H01J37/28

Abstract:
A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.
Public/Granted literature
- US20170025243A1 Apparatus of Plural Charged-Particle Beams Public/Granted day:2017-01-26
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