Invention Grant
- Patent Title: Method of cleaning a substrate and apparatus for performing the same
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Application No.: US15442481Application Date: 2017-02-24
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Publication No.: US10395951B2Publication Date: 2019-08-27
- Inventor: Seok-Hoon Kim , Kyoung-Seob Kim , Dong-Chul Kim , Hyo-San Lee
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Yeongtong-gu, Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Yeongtong-gu, Suwon-si, Gyeonggi-do
- Agency: Muir Patent Law, PLLC
- Priority: KR10-2016-0059285 20160516
- Main IPC: B08B3/00
- IPC: B08B3/00 ; H01L21/67 ; B08B1/04 ; B08B3/02 ; B08B3/10

Abstract:
In a method of cleaning a substrate, a protecting liquid may be sprayed to a surface of the substrate from a first position in a first spray direction. Cleaning droplets may be injected on to the surface of the substrate. The protecting liquid may be sprayed to the surface of the substrate from a second position different from the first position in a second spray direction. For example, the protecting liquid may be always sprayed from the central portion toward the edge portions in the substrate so that the protecting liquid on the substrate may have a uniform thickness.
Public/Granted literature
- US20170330770A1 METHOD OF CLEANING A SUBSTRATE AND APPARATUS FOR PERFORMING THE SAME Public/Granted day:2017-11-16
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