- 专利标题: Defect observation method and device and defect detection device
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申请号: US15317065申请日: 2015-05-27
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公开(公告)号: US10401300B2公开(公告)日: 2019-09-03
- 发明人: Yuko Otani , Yuta Urano , Toshifumi Honda
- 申请人: HITACHI HIGH-TECHNOLOGIES CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Miles & Stockbridge PC
- 优先权: JP2014-131382 20140626
- 国际申请: PCT/JP2015/065318 WO 20150527
- 国际公布: WO2015/198781 WO 20151230
- 主分类号: G01B21/00
- IPC分类号: G01B21/00 ; G01N21/88 ; G01B11/30 ; G01N21/956 ; G01B11/06 ; G01N21/95 ; G01N23/2251 ; G02B21/00 ; G02B21/10 ; G02B21/26 ; G02B27/09 ; G02B27/58 ; G01B15/08 ; G01B11/25 ; G03F7/20
摘要:
A defect observation method for observing a defect on a sample detected by another inspection device with a scanning electron microscope including the steps of: optically detecting the defect using the position information for the defect: illuminating the sample including the defect with an illumination intensity pattern having periodic intensity variation in two dimensions by irradiating a plurality of illumination light beams onto the surface of the sample while phase modulating the light beams in a single direction and successively moving the light beams in small movements in a direction different from the single direction, imaging the surface of the sample that is illuminated by the illumination intensity pattern having periodic intensity variation in two dimensions and includes the defect detected by the other inspection device, and detecting the defect detected by the other inspection device from the image obtained through the imaging of the surface of the sample.
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