Invention Grant
- Patent Title: Laser polycrystallization apparatus
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Application No.: US15848086Application Date: 2017-12-20
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Publication No.: US10403499B2Publication Date: 2019-09-03
- Inventor: Emil Aslanov , Jekil Ryu , Haesook Lee , Gyoowan Han
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin-Si, Gyeonggi-Do
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR Yongin-Si, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2016-0175628 20161221
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/268 ; H01L29/66 ; H01L29/786 ; B23K26/06 ; H01L27/12 ; H01S5/00 ; H01J29/46 ; H01J9/24 ; H01S5/40 ; B23K26/067 ; B23K103/00

Abstract:
A laser polycrystallization apparatus including: a light source for emitting a laser beam; a diffraction grating for receiving the laser beam from the light source, changing a path and a magnitude of the received laser beam, and outputting the changed laser beam; a light split portion for splitting the laser beam received from the diffraction grating; and a light superposition portion for superposing the split laser beams received from the light split portion and irradiating the superposed split laser beams to a substrate. An angle between the laser beam irradiated to an incidence surface of the diffraction grating from the light source and a line substantially perpendicular to an emission surface of the diffraction grating is an acute angle.
Public/Granted literature
- US20180174836A1 LASER POLYCRYSTALLIZATION APPARATUS Public/Granted day:2018-06-21
Information query
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