- Patent Title: Methods and system for processing semiconductor device structures
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Application No.: US15674850Application Date: 2017-08-11
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Publication No.: US10403598B2Publication Date: 2019-09-03
- Inventor: Andrew M. Bayless , Joseph M. Brand
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: TraskBritt
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L21/683

Abstract:
Methods of detaching semiconductor device structures from carrier structures may involve directing a laser through a carrier structure comprising a semiconductor material to a barrier material located between the carrier structure and a semiconductor device structure adhere to an opposite side of the barrier material. A bond between the carrier structure and an adhesive material temporarily securing the carrier structure to the semiconductor device structure may be released in response to heating of the barrier material by the laser beam. The carrier structure may be removed from the semiconductor device structure, the barrier material removed, and an adhesive bonding the semiconductor device structure to the barrier material removed.
Public/Granted literature
- US20190051630A1 METHODS AND SYSTEM FOR PROCESSING SEMICONDUCTOR DEVICE STRUCTURES Public/Granted day:2019-02-14
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