Invention Grant
- Patent Title: Laser processing apparatus and laser processing method
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Application No.: US15988930Application Date: 2018-05-24
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Publication No.: US10406631B2Publication Date: 2019-09-10
- Inventor: Takashi Sampei , Yukiyasu Masuda
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Disco Corporation
- Current Assignee: Disco Corporation
- Current Assignee Address: JP Tokyo
- Agency: Greer Burns & Crain, Ltd.
- Priority: JP2017-104335 20170526
- Main IPC: B23K26/08
- IPC: B23K26/08 ; H01L21/77 ; B23K26/067 ; B23K26/359 ; B23K26/364 ; B23K103/00 ; B23K101/40

Abstract:
A laser processing apparatus includes a laser oscillator configured to oscillate a laser beam, a first condenser configured to focus an S-polarized laser beam, a second condenser configured to focus a P-polarized laser beam, an X-moving unit configured to processing-feed a holding table that holds a wafer thereon in X directions, and first and second indexing feed units configured to indexing-feed the first and second condensers respectively in Y directions. While the wafer is being processed with the laser beam from the first condenser along a projected dicing line on the wafer in the X directions, the second condenser is indexing-fed and positioned on a next projected dicing line along which to process the wafer.
Public/Granted literature
- US20180339365A1 LASER PROCESSING APPARATUS AND LASER PROCESSING METHOD Public/Granted day:2018-11-29
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