- Patent Title: High-purity quinoline derivative and method for manufacturing same
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Application No.: US16229805Application Date: 2018-12-21
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Publication No.: US10407393B2Publication Date: 2019-09-10
- Inventor: Taiju Nakamura , Taichi Abe , Yusuke Miyashita , Hirofumi Kuroda , Yusuke Ayata , Atsushi Akao
- Applicant: Eisai R&D Management Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Eisai R&D Management Co., Ltd.
- Current Assignee: Eisai R&D Management Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Fish & Richardson P.C.
- Priority: JP2014-174062 20140828; JP2015-034729 20150225
- Main IPC: C07D215/48
- IPC: C07D215/48 ; A61K31/47
Abstract:
Provided is a compound represented by formula (IV) or a salt thereof, wherein the content of the compound represented by formula (I) is 350 ppm by mass or less.
Public/Granted literature
- US20190185432A1 HIGH-PURITY QUINOLINE DERIVATIVE AND METHOD FOR MANUFACTURING SAME Public/Granted day:2019-06-20
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