Invention Grant
- Patent Title: Ultra-high charge density electrets and method of making same
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Application No.: US15803155Application Date: 2017-11-03
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Publication No.: US10424441B2Publication Date: 2019-09-24
- Inventor: Steven Tin , Neil Krueger
- Applicant: Honeywell International Inc.
- Applicant Address: US NJ Morris Plains
- Assignee: Honeywell International Inc.
- Current Assignee: Honeywell International Inc.
- Current Assignee Address: US NJ Morris Plains
- Agency: Fogg & Powers LLC
- Main IPC: H01G7/02
- IPC: H01G7/02 ; H04B1/04 ; H02N1/08 ; B81C1/00
Abstract:
An ultra-high charge density electret is disclosed. The ultra-high charge density electret includes a three-dimensional structure having a plurality of sidewalls. A porous silicon dioxide film is formed on the plurality of sidewalls, and the porous silicon dioxide film is charged with a plurality of positive or negative ions.
Public/Granted literature
- US20190013151A1 ULTRA-HIGH CHARGE DENSITY ELECTRETS AND METHOD OF MAKING SAME Public/Granted day:2019-01-10
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