Invention Grant
- Patent Title: Monopole antenna array source with phase shifted zones for semiconductor process equipment
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Application No.: US15858891Application Date: 2017-12-29
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Publication No.: US10431427B2Publication Date: 2019-10-01
- Inventor: Qiwei Liang , Srinivas D. Nemani
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H05H1/46 ; H01L21/3065 ; C23C16/26 ; C23C16/455 ; C23C16/50 ; H01L21/02 ; H01L21/67

Abstract:
A plasma reactor includes a chamber body having an interior space that provides a plasma chamber, a gas distribution port to deliver a processing gas to the plasma chamber, a workpiece support to hold a workpiece, an antenna array comprising a plurality of monopole antennas extending partially into the plasma chamber, and an AC power source to supply a first AC power to the plurality of monopole antennas. The plurality of monopole antennas are divided into a plurality of groups of monopole antennas, and the AC power source is configured to generate AC power on a plurality of power supply lines at a plurality of different phases, and different groups of monopole antennas are coupled to different power supply lines.
Public/Granted literature
- US20180342372A1 MONOPOLE ANTENNA ARRAY SOURCE WITH PHASE SHIFTED ZONES FOR SEMICONDUCTOR PROCESS EQUIPMENT Public/Granted day:2018-11-29
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