Invention Grant
- Patent Title: Method and apparatus for back-biased switch transistors
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Application No.: US15988916Application Date: 2018-05-24
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Publication No.: US10431558B2Publication Date: 2019-10-01
- Inventor: Sinan Goktepeli
- Applicant: QUALCOMM Incorporated
- Applicant Address: US CA San Diego
- Assignee: QUALCOMM Incorporated
- Current Assignee: QUALCOMM Incorporated
- Current Assignee Address: US CA San Diego
- Agency: Qualcomm Incorporated/Seyfarth Shaw LLP
- Main IPC: H01L21/36
- IPC: H01L21/36 ; H01L21/00 ; H01L23/66 ; H01L41/09 ; H01L27/146 ; H01L23/522 ; H01L29/66 ; H01L29/786 ; H01L27/12 ; H01L23/48

Abstract:
An integrated radio frequency (RF) circuit structure may include an active device on a first surface of an isolation layer. The integrated RF circuit structure may also include a back-bias metallization on a second surface opposite the first surface of the isolation layer. A body of the active device is biased by the back-bias metallization. The integrated RF circuit structure may further include a handle substrate on a front-side dielectric layer on the active device.
Public/Granted literature
- US20180277502A1 METHOD AND APPARATUS FOR BACK-BIASED SWITCH TRANSISTORS Public/Granted day:2018-09-27
Information query
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