- Patent Title: Apparatus having a cavity structure and method for producing same
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Application No.: US15927574Application Date: 2018-03-21
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Publication No.: US10442682B2Publication Date: 2019-10-15
- Inventor: Stephan Pindl
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Slater Matsil, LLP
- Priority: DE102017204817 20170322
- Main IPC: H01L31/058
- IPC: H01L31/058 ; B81B7/00 ; B81C1/00 ; H01L23/34 ; G01N29/24

Abstract:
The present disclosure relates to an apparatus having a substrate arrangement with a first circuit arrangement that heats up during operation and a second circuit arrangement that is integrated into a substrate material of the substrate arrangement. Further, the apparatus has a cavity structure that is arranged between the first and the second circuit arrangement, said cavity structure being formed in the substrate material and having a pressure that is lower than an ambient atmospheric pressure. The present disclosure further relates to a method for producing such an apparatus (10).
Public/Granted literature
- US20180273373A1 APPARATUS HAVING A CAVITY STRUCTURE AND METHOD FOR PRODUCING SAME Public/Granted day:2018-09-27
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