Invention Grant
- Patent Title: Wiring substrate and process for producing it
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Application No.: US16238586Application Date: 2019-01-03
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Publication No.: US10448506B2Publication Date: 2019-10-15
- Inventor: Tomoya Hosoda , Tatsuya Terada
- Applicant: AGC Inc.
- Applicant Address: JP Chiyoda-ku
- Assignee: AGC Inc.
- Current Assignee: AGC Inc.
- Current Assignee Address: JP Chiyoda-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2016-171195 20160901
- Main IPC: H05K1/03
- IPC: H05K1/03 ; H05K1/11 ; H05K3/18 ; H05K3/40 ; H05K1/02 ; H05K3/42 ; H01Q1/38

Abstract:
To provide a wiring substrate having excellent transmission characteristics, of which initial failure of a plating layer formed on an inner wall surface of a hole is suppressed regardless of the type of the pre-treatment applied to the inner wall surface of the hole, and of which the plating layer has favorable heat resistance, and a process for producing it.A wiring substrate 10 comprising an electrical insulator layer 20, a first conductor layer 32 formed on a first surface of the electrical insulator layer 20, a second conductor layer 34 formed on a second surface of the electrical insulator layer 20, and a plating layer 42 provided on an inner wall surface of a hole 40 which opens from the first conductor layer 32 through the second conductor layer 34; wherein the electrical insulator layer 20 has a heat resistant resin layer 22 containing a heat resistant resin and a resin powder; the resin powder is formed from a resin material containing a melt-formable fluororesin having a functional group such as a carbonyl group-containing group; the content of the resin powder is from 5 to 70 mass % to the heat resistant resin layer 22; and the electrical insulator layer 20 has a dielectric constant of from 2.0 to 3.5.
Public/Granted literature
- US20190141833A1 WIRING SUBSTRATE AND PROCESS FOR PRODUCING IT Public/Granted day:2019-05-09
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