Invention Grant
- Patent Title: Measurement substrate, a measurement method and a measurement system
-
Application No.: US16343425Application Date: 2017-09-08
-
Publication No.: US10451981B2Publication Date: 2019-10-22
- Inventor: Tiannan Guan , Jingshi Li , Miao Yu
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP16196279 20161028
- International Application: PCT/EP2017/072543 WO 20170908
- International Announcement: WO2018/077517 WO 20180503
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A method of measuring wear of a substrate holder that is configured to hold a production substrate, the method includes: clamping a measurement substrate to the substrate holder; and measuring strain in the measurement substrate to generate a measurement result. The measurement substrate may have a body having dimensions similar to that of the production substrate; and a strain sensor in the body configured to measure strain in a peripheral portion of the measurement substrate.
Public/Granted literature
- US20190243257A1 A MEASUREMENT SUBSTRATE, A MEASUREMENT METHOD AND A MEASUREMENT SYSTEM Public/Granted day:2019-08-08
Information query
IPC分类:
