公开(公告)号：US11614689B2

公开(公告)日：2023-03-28

申请号：US17580696

申请日：2022-01-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Johannes Cornelis Paulus Melman ,  Han Henricus Aldegonda Lempens ,  Miao Yu ,  Cornelius Maria Rops ,  Ruud Olieslagers ,  Artunç Ulucan ,  Theodorus Wilhelmus Polet ,  Patrick Johannes Wilhelmus Spruytenburg

IPC: G03F7/20 ,  H01L21/027

Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.

公开(公告)号：US11099490B2

公开(公告)日：2021-08-24

申请号：US16310537

申请日：2017-06-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Arnoldus Leonardus Johannes Raaymakers ,  Peter Johannes Antonius Raedts ,  Miao Yu

IPC: G03F7/20 ,  H01L21/66 ,  H01L21/67

Abstract: An inspection substrate for inspecting a component of an apparatus for processing production substrates, the inspection substrate having: a body having dimensions similar to the production substrates so that the inspection substrate is compatible with the apparatus; a sensor configured to generate inspection information relating to a parameter of the component of the apparatus, the sensor embedded in the body; a control detector embedded in the body and configured to detect a control signal transmitted by the apparatus for processing production substrates; and a controller embedded in the body and configured to control the sensor in response to detection of the control signal.

公开(公告)号：US10725390B2

公开(公告)日：2020-07-28

申请号：US16249518

申请日：2019-01-16

Applicant: ASML Netherlands B.V.

Inventor： Seerwan Saeed ,  Petrus Martinus Gerardus Johannes Arts ,  Harold Sebastiaan Buddenberg ,  Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Floor Lodewijk Keukens ,  Ferdy Migchelbrink ,  Jeroen Arnoldus Leonardus Johannes Raaymakers ,  Arnoldus Johannes Martinus Jozeph Ras ,  Gheorghe Tanasa ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Daan Daniel Johannes Antonius Van Sommeren ,  Marijn Wouters ,  Miao Yu

IPC: G03F7/20 ,  H01L21/66 ,  G01N21/95 ,  H01L27/146 ,  H01L27/148

Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.

公开(公告)号：US20220137519A1

公开(公告)日：2022-05-05

申请号：US17580696

申请日：2022-01-21

Applicant: ASML Netherlands B.V.

Inventor： Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Johannes Cornelis Paulus Melman ,  Han Henricus Aldegonda Lempens ,  Miao Yu ,  Cornelius Maria Rops ,  Ruud Olieslagers ,  Artunç Ulucan ,  Theodorus Wilhelmus Polet ,  Patrick Johannes Wilhelmus Spruytenburg

IPC: G03F7/20 ,  H01L21/027

Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.

公开(公告)号：US10416571B2

公开(公告)日：2019-09-17

申请号：US16063583

申请日：2016-12-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Johannes Cornelis Paulus Melman ,  Han Henricus Aldegonda Lempens ,  Miao Yu ,  Cornelius Maria Rops ,  Ruud Olieslagers ,  Artunç Ulucan ,  Theodorus Wilhelmus Polet ,  Patrick Johannes Wilhelmus Spruytenburg

IPC: G03F7/20 ,  H01L21/027

Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.

公开(公告)号：US11231653B2

公开(公告)日：2022-01-25

申请号：US17186117

申请日：2021-02-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Johannes Cornelis Paulus Melman ,  Han Henricus Aldegonda Lempens ,  Miao Yu ,  Cornelius Maria Rops ,  Ruud Olieslagers ,  Artunç Ulucan ,  Theodorus Wilhelmus Polet ,  Patrick Johannes Wilhelmus Spruytenburg

IPC: G03F7/20 ,  H01L21/027

Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.

公开(公告)号：US10969695B2

公开(公告)日：2021-04-06

申请号：US16570382

申请日：2019-09-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Johannes Cornelis Paulus Melman ,  Han Henricus Aldegonda Lempens ,  Miao Yu ,  Cornelius Maria Rops ,  Ruud Olieslagers ,  Artunç Ulucan ,  Theodorus Wilhelmus Polet ,  Patrick Johannes Wilhelmus Spruytenburg

IPC: H01L21/027 ,  G03F7/20

Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.

公开(公告)号：US20190146352A1

公开(公告)日：2019-05-16

申请号：US16249518

申请日：2019-01-16

Applicant: ASML Netherlands B.V.

Inventor： Seerwan Saeed ,  Petrus Martinus Gerardus Johannes Arts ,  Harold Sebastiaan Buddenberg ,  Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Floor Lodewijk Keukens ,  Ferdy Migchelbrink ,  Jeroen Arnoldus Leonardus Johannes Raaymakers ,  Arnoldus Johannes Martinus Jozeph Ras ,  Gheorghe Tanasa ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Daan Daniel Johannes Antonius Van Sommeren ,  Marijn Wouters ,  Miao Yu

IPC: G03F7/20 ,  H01L21/66 ,  G01N21/95

Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.

公开(公告)号：US10345713B2

公开(公告)日：2019-07-09

申请号：US16309490

申请日：2017-06-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Arnoldus Leonardus Johannes Raaymakers ,  Pascal Jean Henri Bloemen ,  Petrus Theodorus Jutte ,  Arnoldus Johannes Martinus Jozeph Ras ,  Miao Yu

IPC: G03F7/20

Abstract: An inspection substrate for inspecting a component of an apparatus for processing production substrates, the inspection substrate has: a body having dimensions similar to the production substrates so that the inspection substrate is compatible with the apparatus; an illumination device embedded in the body, the illumination device configured to emit radiation toward a target area of the component of the apparatus; an imaging device embedded in the body, the imaging device configured to detect radiation scattered at the target area and generate an image from the detected radiation, wherein the illumination device is configured to emit the radiation such that radiation that is specularly reflected at the target area does not contribute to the image generated by the imaging device.

公开(公告)号：US10216100B2

公开(公告)日：2019-02-26

申请号：US15738701

申请日：2016-06-16

Applicant: ASML Netherlands B.V.

Inventor： Seerwan Saeed ,  Petrus Martinus Gerardus Johannes Arts ,  Harold Sebastiaan Buddenberg ,  Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Floor Lodewijk Keukens ,  Ferdy Migchelbrink ,  Jeroen Arnoldus Leonardus Johannes Raaymakers ,  Arnoldus Johannes Martinus Jozeph Ras ,  Gheorghe Tanasa ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Daan Daniel Johannes Antonius Van Sommeren ,  Marijn Wouters ,  Miao Yu

IPC: G01N21/00 ,  G03F7/20 ,  H01L21/66 ,  G01N21/95 ,  H01L27/146 ,  H01L27/148

Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.