Invention Grant
- Patent Title: Detecting deviations between event log and process model
-
Application No.: US14748867Application Date: 2015-06-24
-
Publication No.: US10452987B2Publication Date: 2019-10-22
- Inventor: Jing Li , Xiang Li , Haifeng Liu , Guo Tong Xie , Yi Qin Yu , Shi Lei Zhang
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee Address: US NY Armonk
- Agency: Cantor Colburn LLP
- Agent Grant Johnson
- Priority: CN201410038281 20140126
- Main IPC: G06N7/00
- IPC: G06N7/00

Abstract:
A method for detecting deviations between an event log and a process model includes converting the process model into a probability process model, the probability process model comprising multiple nodes in multiple hierarchies and probability distribution associated with the multiple nodes, a leaf node among the multiple nodes corresponding to an activity in the process model; detecting differences between at least one event sequence contained in the event log and the probability process model according to a correspondence relationship; and identifying the differences as the deviations in response to the differences exceeding a predefined threshold; wherein the correspondence relationship describes a correspondence relationship between an event in one event sequence of the at least one event sequence and a leaf node in the probability process model.
Public/Granted literature
- US20150302314A1 DETECTING DEVIATIONS BETWEEN EVENT LOG AND PROCESS MODEL Public/Granted day:2015-10-22
Information query
IPC分类:
G | 物理 |
G06 | 计算;推算或计数 |
G06N | 基于特定计算模型的计算机系统 |
G06N7/00 | 基于特定数学模式的计算机系统 |