Invention Grant
- Patent Title: Plasma reactor having digital control over rotation frequency of a microwave field with direct up-conversion
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Application No.: US16213978Application Date: 2018-12-07
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Publication No.: US10453655B2Publication Date: 2019-10-22
- Inventor: Satoru Kobayashi , Hideo Sugai , Soonam Park , Kartik Ramaswamy , Dmitry Lubomirsky
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: H01J37/32
- IPC: H01J37/32
Abstract:
A plasma reactor for processing a workpiece has a microwave source with a digitally synthesized rotation frequency using direct digital up-conversion and a user interface for controlling the rotation frequency.
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