• Patent Title: Ion filter and method of manufacturing ion filter
  • Application No.: US15781018
    Application Date: 2016-12-02
  • Publication No.: US10453661B2
    Publication Date: 2019-10-22
  • Inventor: Daisuke Arai
  • Applicant: FUJIKURA LTD.
  • Applicant Address: JP Tokyo
  • Assignee: FUJIKURA LTD.
  • Current Assignee: FUJIKURA LTD.
  • Current Assignee Address: JP Tokyo
  • Agency: Osha Liang LLP
  • Priority: JP2015-235481 20151202
  • International Application: PCT/JP2016/085947 WO 20161202
  • International Announcement: WO2017/094896 WO 20170608
  • Main IPC: H01J47/00
  • IPC: H01J47/00 H01J47/06
Ion filter and method of manufacturing ion filter
Abstract:
An ion filter is used for a gas detector including a gas electron multiplier. The ion filter includes: an insulating substrate; a first patterned conductive layer on one main surface of the insulating substrate; and a second patterned conductive layer on another main surface of the insulating substrate. The ion filter has a plurality of through-holes formed along a thickness direction of the insulating substrate on which the first patterned conductive layer and the second patterned conductive layer are formed. The one main surface of the insulating substrate is disposed on an upstream side in a movement direction of electrons in the gas detector. The other main surface of the insulating substrate is disposed on a downstream side in the movement direction of the electrons in the gas detector. The first patterned conductive layer has a line width thicker than a line width of the second patterned conductive layer.
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