Invention Grant
- Patent Title: Removal of metal
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Application No.: US15867993Application Date: 2018-01-11
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Publication No.: US10453673B2Publication Date: 2019-10-22
- Inventor: Brian Dolan , Robert J. Hanson , Chan Lim
- Applicant: MICRON TECHNOLOGY, INC.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Dicke, Billig & Czaja, PLLC
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/66

Abstract:
Methods of removing metal from a portion of a substrate include exposing the substrate to a reducing environment comprising at least one reducing agent and at least one oxidizing agent, determining whether metal remaining on the portion of the substrate is less than or equal to a particular level, and exposing the substrate to an oxidizing environment comprising at least one oxidizing agent and at least one reducing agent if the metal remaining on the portion of the substrate is deemed to be greater than the particular level.
Public/Granted literature
- US20180138033A1 REMOVAL OF METAL Public/Granted day:2018-05-17
Information query
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