- 专利标题: Shaped beam lithography including temperature effects
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申请号: US15298464申请日: 2016-10-20
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公开(公告)号: US10460071B2公开(公告)日: 2019-10-29
- 发明人: Akira Fujimura , Harold Robert Zable , Ryan Pearman , William Guthrie
- 申请人: D2S, Inc.
- 申请人地址: US CA San Jose
- 专利权人: D2S, Inc.
- 当前专利权人: D2S, Inc.
- 当前专利权人地址: US CA San Jose
- 代理机构: MLO, a professional corp.
- 主分类号: G06F17/50
- IPC分类号: G06F17/50 ; G03F1/36 ; H01J37/302 ; H01J37/317
摘要:
In some embodiments, data is received defining a plurality of shot groups that will be delivered by a charged particle beam writer during an overall time period, where a first shot group will be delivered onto a first designated area at a first time period. A temperature of the first designated area at a different time period is determined. In some embodiments, the different time period is when secondary effects of exposure from a second shot group are received at the first designated area. In some embodiments, transient temperatures of a target designated area are determined at time periods when exposure from a shot group is received. An effective temperature of the target area is determined, using the transient temperatures and applying a compensation factor based on an amount of exposure received during that time period. A shot in the target shot group is modified based on the effective temperature.
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