Invention Grant
- Patent Title: Dual mode inspector
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Application No.: US15200586Application Date: 2016-07-01
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Publication No.: US10475173B2Publication Date: 2019-11-12
- Inventor: Steven W. Meeks , Rusmin Kudinar , Ronny Soetarman , Hung P. Nguyen , James Jianguo Xu
- Applicant: Zeta Instruments, Inc.
- Applicant Address: US CA Milpitas
- Assignee: KLA-TENCOR CORPORATION
- Current Assignee: KLA-TENCOR CORPORATION
- Current Assignee Address: US CA Milpitas
- Agency: Imperium Patent Works LLP
- Agent Mark D. Marrello
- Main IPC: G06K9/62
- IPC: G06K9/62 ; G06T7/00

Abstract:
A dual mode inspector includes an optical inspector configured to detect a defect located at a first location on a sample, a microscope configured to capture an image of the defect at the first location on the sample, and a platform that is configured to support the sample. The sample is not removed from the platform between the detecting of the defect located at the first location on the sample and the capturing of the image of the defect at the first location on the sample. The dual mode optical inspector also includes a controller that causes the optical inspector to detect the defect located at the first location on the sample and causes the microscope to capture the image of the defect at the first location on the sample. The dual mode inspector also performs scanning lens distortion correction to improve the capturing of defect images.
Public/Granted literature
- US10769769B2 Dual mode inspector Public/Granted day:2020-09-08
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