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公开(公告)号：US20180005364A1
公开(公告)日：2018-01-04
申请号：US15200586
申请日：2016-07-01
Applicant: Zeta Instruments, Inc.
Inventor： Steven W. Meeks , Rusmin Kudinar , Ronny Soetarman , Hung P. Nguyen , James Jianguo Xu
Abstract: A dual mode inspector includes an optical inspector configured to detect a defect located at a first location on a sample, a microscope configured to capture an image of the defect at the first location on the sample, and a platform that is configured to support the sample. The sample is not removed from the platform between the detecting of the defect located at the first location on the sample and the capturing of the image of the defect at the first location on the sample. The dual mode optical inspector also includes a controller that causes the optical inspector to detect the defect located at the first location on the sample and causes the microscope to capture the image of the defect at the first location on the sample. The dual mode inspector also performs scanning lens distortion correction to improve the capturing of defect images.
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公开(公告)号：US20170261440A1
公开(公告)日：2017-09-14
申请号：US15607648
申请日：2017-05-29
Applicant: Zeta Instruments, Inc.
Inventor： Steven W. Meeks , Ronny Soetarman
IPC: G01N21/958
CPC classification number: G01N21/958 , G01N21/47 , G01N21/8422 , G01N21/896 , G01N21/9505 , G01N21/9506 , G01N2021/4711 , G01N2021/4735 , G01N2021/8967
Abstract: A method and apparatus to measure specular reflection intensity, specular reflection angle, near specular scattered radiation, and large angle scattered radiation and determine the location and type of defect present in a first and a second transparent solid that have abutting surfaces. The types of defects include a top surface particle, an interface particle, a bottom surface particle, an interface bubble, a top surface pit, and a stain. The four measurements are conducted at multiple locations along the surface of the transparent solid and the measured information is stored in a memory device. The difference between an event peak and a local average of measurements for each type of measurement is used to detect changes in the measurements. Information stored in the memory device is processed to generate a work piece defect mapping indicating the type of defect and the defect location of each defect found.
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公开(公告)号：US20160252714A1
公开(公告)日：2016-09-01
申请号：US15150411
申请日：2016-05-09
Applicant: Zeta Instruments, Inc.
Inventor： Zhen Hou , James Jianguo Xu , Ken Kinsun Lee , James Nelson Stainton , Hung Phi Nguyen , Rusmin Kudinar , Ronny Soetarman
CPC classification number: G02B21/006 , G01N21/9501 , G01N21/956 , G01N2021/0168 , G02B21/0016 , G02B21/0028 , G02B21/0032 , G02B21/367 , G06T7/60 , G06T2207/10056 , G06T2207/10152 , G06T2207/20068 , G06T2207/30148
Abstract: A three-dimensional (3D) microscope for patterned substrate measurement can include an objective lens, a reflected illuminator, a transmitted illuminator, a focusing adjustment device, an optical sensor, and a processor. The focusing adjustment device can automatically adjust the objective lens focus at a plurality of Z steps. The optical sensor can be capable of acquiring images at each of these Z steps. The processor can control the reflected illuminator, the transmitted illuminator, the focusing adjustment device, and the optical sensor. The processor can be configured to capture first and second images at multiple Z steps, the first image with the pattern using the reflected illuminator and the second image without the pattern using one of the reflected illuminator and the transmitted illuminator.
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公开(公告)号：US10769769B2
公开(公告)日：2020-09-08
申请号：US15200586
申请日：2016-07-01
Applicant: Zeta Instruments, Inc.
Inventor： Steven W. Meeks , Rusmin Kudinar , Ronny Soetarman , Hung P. Nguyen , James Jianguo Xu
Abstract: A dual mode inspector includes an optical inspector configured to detect a defect located at a first location on a sample, a microscope configured to capture an image of the defect at the first location on the sample, and a platform that is configured to support the sample. The sample is not removed from the platform between the detecting of the defect located at the first location on the sample and the capturing of the image of the defect at the first location on the sample. The dual mode optical inspector also includes a controller that causes the optical inspector to detect the defect located at the first location on the sample and causes the microscope to capture the image of the defect at the first location on the sample. The dual mode inspector also performs scanning lens distortion correction to improve the capturing of defect images.
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公开(公告)号：US20170336330A1
公开(公告)日：2017-11-23
申请号：US15159266
申请日：2016-05-19
Applicant: Zeta Instruments, Inc.
Inventor： Steven W. Meeks , Rusmin Kudinar , Ronny Soetarman , Hung P. Nguyen
IPC: G01N21/958 , G01N21/55 , G01N21/94
CPC classification number: G01N21/958 , G01L1/00 , G01N21/21 , G01N21/55 , G01N21/8806 , G01N21/94 , G01N2021/8854 , G01N2201/06113 , G01N2201/0683 , G01N2201/105 , G01N2201/1247
Abstract: A method for detecting defects includes directing a scanning beam to a location on a surface of a transparent sample, measuring top and bottom surface specular reflection intensity, and storing coordinate values of the first location and the top and bottom surface specular reflection intensity in a memory. The method may further include comparing the top surface specular reflection intensity measured at each location with a first threshold value, comparing the bottom surface specular reflection intensity measured at each location with a second threshold value, and determining if a defect is present at each location and on which surface the defect is present. The method may further include comparing the top surface specular reflection intensity measured at each location with a first intensity range, comparing the bottom surface specular reflection intensity measured at each location with a second intensity range, and determining on which surface the defect is present.
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Patent Agency Ranking
公开(公告)号：US10359613B2
公开(公告)日：2019-07-23
申请号：US15346594
申请日：2016-11-08
Applicant: Zeta Instruments, Inc.
Inventor： James Jianguo Xu , Ronny Soetarman , Budi Hartono
Abstract: A method of generating 3D information includes: varying the distance between the sample and an objective lens of the optical microscope at pre-determined steps, capturing an image at each pre-determined step; determining a characteristic value of each pixel in each captured image; determining, for each captured image, the greatest characteristic value across all pixels in the captured image; comparing the greatest characteristic value for each captured image to determine if a surface of the sample is present at each pre-determined step; determining a first captured image that is focused on a first surface of the sample based on the characteristic value of each pixel in each captured image; determining a second captured image that is focused on a second surface of the sample based on the characteristic value of each pixel in each captured image; and determining a first distance between the first surface and the second surface.
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公开(公告)号：US10094787B2
公开(公告)日：2018-10-09
申请号：US15159626
申请日：2016-05-19
Applicant: Zeta Instruments, Inc.
Inventor： Steven W. Meeks , Rusmin Kudinar , Ronny Soetarman , Hung P. Nguyen
IPC: G01N21/00 , G01N21/958 , G01N21/21 , G01N21/55
Abstract: An optical inspector includes a time varying beam reflector, a radiating source that irradiates the time varying beam reflector, a telecentric scan lens configured to direct the radiation reflected by the time varying beam reflector onto a first surface of a transparent sample, a first detector that receives at least a portion of top surface specular reflection, a second detector that receives at least a portion of the bottom surface specular reflection. A turning mirror may also be included. The turning mirror is a switchable mirror that can be adjusted to a first position where the turning mirror reflects the top and bottom surface specular reflection, and can be adjusted to a second position where the turning mirror does not reflect the top or the bottom surface specular reflection. A first and second polarizing element may also be included to detect additional types of defects on either surface.
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公开(公告)号：US20180045947A1
公开(公告)日：2018-02-15
申请号：US15346607
申请日：2016-11-08
Applicant: Zeta Instruments, Inc.
Inventor： Ronny Soetarman , James Jianguo Xu
CPC classification number: G02B21/244 , G02B21/0016 , G02B21/367
Abstract: A method of generating 3D information including: varying the distance between the sample and an objective lens of the optical microscope at pre-determined steps; capturing an image at each pre-determined step; determining a characteristic value of each pixel in each captured image; determining, for each captured image, the greatest characteristic value across a first portion of pixels in the captured image; comparing the greatest characteristic value for each captured image to determine if a surface of the sample is present at each pre-determined step; determining a first captured image that is focused on an apex of a bump of the sample; determining a second captured image that is focused on a first surface of the sample based on the characteristic value of each pixel in each captured image; and determining a first distance between the apex of the bump and the first surface.
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公开(公告)号：US10475173B2
公开(公告)日：2019-11-12
申请号：US15200586
申请日：2016-07-01
Applicant: Zeta Instruments, Inc.
Inventor： Steven W. Meeks , Rusmin Kudinar , Ronny Soetarman , Hung P. Nguyen , James Jianguo Xu
Abstract: A dual mode inspector includes an optical inspector configured to detect a defect located at a first location on a sample, a microscope configured to capture an image of the defect at the first location on the sample, and a platform that is configured to support the sample. The sample is not removed from the platform between the detecting of the defect located at the first location on the sample and the capturing of the image of the defect at the first location on the sample. The dual mode optical inspector also includes a controller that causes the optical inspector to detect the defect located at the first location on the sample and causes the microscope to capture the image of the defect at the first location on the sample. The dual mode inspector also performs scanning lens distortion correction to improve the capturing of defect images.
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公开(公告)号：US10168524B2
公开(公告)日：2019-01-01
申请号：US15346607
申请日：2016-11-08
Applicant: Zeta Instruments, Inc.
Inventor： Ronny Soetarman , James Jianguo Xu
Abstract: A method of generating 3D information including: varying the distance between the sample and an objective lens of the optical microscope at pre-determined steps; capturing an image at each pre-determined step; determining a characteristic value of each pixel in each captured image; determining, for each captured image, the greatest characteristic value across a first portion of pixels in the captured image; comparing the greatest characteristic value for each captured image to determine if a surface of the sample is present at each pre-determined step; determining a first captured image that is focused on an apex of a bump of the sample; determining a second captured image that is focused on a first surface of the sample based on the characteristic value of each pixel in each captured image; and determining a first distance between the apex of the bump and the first surface.
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