Invention Grant
- Patent Title: Process for producing of polycrystalline silicon
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Application No.: US15887069Application Date: 2018-02-02
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Publication No.: US10475646B2Publication Date: 2019-11-12
- Inventor: Chang Ryol Kim , A Youn Cho , Ja Cheol Koo , Yong Chul Shin
- Applicant: OCI Company Ltd.
- Applicant Address: KR Seoul
- Assignee: OCI COMPANY LTD.
- Current Assignee: OCI COMPANY LTD.
- Current Assignee Address: KR Seoul
- Agency: Fay Sharpe LLP
- Priority: KR10-2017-0015479 20170203
- Main IPC: B01D53/86
- IPC: B01D53/86 ; G05B21/00 ; C01B33/039 ; B01J8/18 ; C01B33/021 ; C01B33/107 ; H01L21/02 ; C01B33/03 ; C23C16/24 ; C23C16/44 ; C23C16/448 ; C23C16/455

Abstract:
The present invention relates to a process for producing of polycrystalline silicon, and the method includes (1) preparing a silicon-containing gas; (2) storing the silicon-containing gas in a storage tank; (3) depositing polycrystalline silicon by injecting the silicon-containing gas stored in the storage tank to a CVD reactor; (4) treating an off-gas emitted in the depositing step; and (5) injecting the gas treated in the treating step to the storage tank.
Public/Granted literature
- US20180226249A1 Process for Producing of Polycrystalline Silicon Public/Granted day:2018-08-09
Information query
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