Invention Grant
- Patent Title: Method and structures for heat dissipating interposers
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Application No.: US16156595Application Date: 2018-10-10
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Publication No.: US10475733B2Publication Date: 2019-11-12
- Inventor: Cyprian Emeka Uzoh , Pezhman Monadgemi , Terrence Caskey , Fatima Lina Ayatollahi , Belgacem Haba , Charles G. Woychik , Michael Newman
- Applicant: Invensas Corporation
- Applicant Address: US CA San Jose
- Assignee: Invensas Corporation
- Current Assignee: Invensas Corporation
- Current Assignee Address: US CA San Jose
- Agency: Lerner, David, Littenberg, Krumholz & Mentlik, LLP
- Main IPC: H05K1/09
- IPC: H05K1/09 ; H05K1/11 ; H05K3/38 ; H01L21/02 ; H01L21/48 ; H01L23/52 ; H01L23/522 ; H01L23/532 ; H01L23/498 ; H01L21/768 ; H01L23/373 ; H01L23/367 ; H01L23/48 ; H01L23/36

Abstract:
An interconnect element includes a semiconductor or insulating material layer that has a first thickness and defines a first surface; a thermally conductive layer; a plurality of conductive elements; and a dielectric coating. The thermally conductive layer includes a second thickness of at least 10 microns and defines a second surface of the interconnect element. The plurality of conductive elements extend from the first surface of the interconnect element to the second surface of the interconnect element. The dielectric coating is between at least a portion of each conductive element and the thermally conductive layer.
Public/Granted literature
- US20190139878A1 METHOD AND STRUCTURES FOR HEAT DISSIPATING INTERPOSERS Public/Granted day:2019-05-09
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