- 专利标题: Evaluation method, correction method, recording medium and electron beam lithography system
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申请号: US15978747申请日: 2018-05-14
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公开(公告)号: US10483082B2公开(公告)日: 2019-11-19
- 发明人: Rieko Nishimura
- 申请人: NuFlare Technology, Inc.
- 申请人地址: JP Yokohama-shi
- 专利权人: NuFlare Technology, Inc.
- 当前专利权人: NuFlare Technology, Inc.
- 当前专利权人地址: JP Yokohama-shi
- 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2015-230771 20151126; JP2016-172750 20160905
- 主分类号: H01J37/22
- IPC分类号: H01J37/22 ; H01J37/09 ; H01J37/317 ; H01J37/304
摘要:
An evaluation method according to an embodiment is to evaluate a precision of an aperture formed with multiple openings, and includes steps of forming a first evaluation pattern based on evaluation data using multiple electron beams generated by electron beam that has passed through the aperture, dividing the aperture into multiple regions, each of the regions including the multiple openings and defining the multiple divided regions, forming a second evaluation pattern based on evaluation data using the electron beam that has passed through a first divided region among the multiple divided regions, comparing the first evaluation pattern with the second evaluation pattern, and evaluating the precision of the aperture based on the comparison result between the first evaluation pattern and the second evaluation pattern.
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