Invention Grant
- Patent Title: Three-dimensional semiconductor device
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Application No.: US16178860Application Date: 2018-11-02
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Publication No.: US10483323B2Publication Date: 2019-11-19
- Inventor: Joyoung Park , Seok-Won Lee , Seongjun Seo
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-Do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2015-0045728 20150331
- Main IPC: H01L27/24
- IPC: H01L27/24 ; H01L27/11556 ; H01L27/11582 ; H01L27/11519 ; H01L27/11548 ; H01L27/11565 ; H01L27/11575 ; H01L27/06

Abstract:
A three-dimensional semiconductor device is provided as follows. A substrate includes a contact region, a dummy region, and a cell array region. A stack structure includes electrodes vertically stacked on the substrate. The electrodes are stacked to have a first stepwise structure on the contact region and a second stepwise structure in the dummy region. Ends of at least two adjacent electrodes in the second stepwise structure have first sidewalls vertically aligned so that horizontal positions of the first sidewalls are substantially the same.
Public/Granted literature
- US20190081105A1 THREE-DIMENSIONAL SEMICONDUCTOR DEVICE Public/Granted day:2019-03-14
Information query
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