Invention Grant
- Patent Title: High efficiency vapor transport sublimation source using baffles coated with source material
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Application No.: US15492556Application Date: 2017-04-20
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Publication No.: US10483498B2Publication Date: 2019-11-19
- Inventor: William E. Quinn , Gregory McGraw
- Applicant: UNIVERSAL DISPLAY CORPORATION
- Applicant Address: US NJ Ewing
- Assignee: Universal Display Corporation
- Current Assignee: Universal Display Corporation
- Current Assignee Address: US NJ Ewing
- Agency: Morris & Kamlay LLP
- Main IPC: H01L51/56
- IPC: H01L51/56 ; H01L51/00 ; C23C16/448 ; C23C16/455
Abstract:
A source of material for use in a deposition system includes one or more baffles or equivalent structures within the source. The baffles provide for increased concentration of material entrained in a carrier gas that is passed through and emitted by the source.
Public/Granted literature
- US20170306486A1 HIGH EFFICIENCY VAPOR TRANSPORT SUBLIMATION SOURCE USING BAFFLES COATED WITH SOURCE MATERIAL Public/Granted day:2017-10-26
Information query
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