Invention Grant
- Patent Title: Negative type photosensitive resin composition, negative type planographic printing plate precursor, and method of preparing planographic printing plate
-
Application No.: US15880539Application Date: 2018-01-26
-
Publication No.: US10509317B2Publication Date: 2019-12-17
- Inventor: Yuichi Yasuhara , Atsuyasu Nozaki
- Applicant: FUJIFILM CORPORATION
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM CORPORATION
- Current Assignee: FUJIFILM CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Solaris Intellectual Property Group, PLLC
- Priority: JP2015-189519 20150928
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/038 ; G03F7/029 ; B41C1/10 ; C08F220/14 ; G03F7/32

Abstract:
A negative type photosensitive resin composition includes a polymer compound which has, in a main chain thereof, a constitutional unit A represented by Formula A-1, a constitutional unit B that is at least one of constitutional units represented by Formulae B-1, B-2, B-3, B-4, B-5, B-6, or B-7, and a constitutional unit C containing an ethylenically unsaturated group; and a polymerization initiator. A negative type planographic printing plate precursor includes an image recording layer containing the negative type photosensitive resin composition. A method of preparing a planographic printing plate includes, in order, an exposure step of image-exposing the negative type planographic printing plate precursor; and a development step of performing development by removing a non-exposed portion of the exposed negative type planographic printing plate precursor using a developer.
Public/Granted literature
Information query
IPC分类: