公开(公告)号：US11934102B2

公开(公告)日：2024-03-19

申请号：US18337442

申请日：2023-06-20

Applicant: FUJIFILM Corporation

Inventor： Atsuyasu Nozaki ,  Misaki Takashima ,  Naoki Sato ,  Atsushi Nakamura

IPC: G03F7/30 ,  G03F7/038 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40 ,  H01L21/027

CPC classification number: G03F7/3057 ,  G03F7/0387 ,  G03F7/2051 ,  G03F7/327 ,  G03F7/40 ,  H01L21/0275

Abstract: There is provided a manufacturing method for a cured substance, which makes it possible to obtain a cured substance having excellent breaking elongation, a manufacturing method for a laminate, including the manufacturing method for a cured substance, a manufacturing method for a semiconductor device, including the manufacturing method for a cured substance or the manufacturing method for a laminate, and there is provided a treatment liquid that is used in the manufacturing method for a cured substance.
The manufacturing method for a cured substance includes a film forming step of applying a resin composition containing a precursor of a cyclization resin onto a base material to form a film, a treatment step of bringing a treatment liquid into contact with the film, and a heating step of heating the film after the treatment step, in which the treatment liquid contains at least one compound selected from the group consisting of a basic compound having an amide group and a base generator having an amide group.

公开(公告)号：US10509317B2

公开(公告)日：2019-12-17

申请号：US15880539

申请日：2018-01-26

Applicant: FUJIFILM CORPORATION

Inventor： Yuichi Yasuhara ,  Atsuyasu Nozaki

IPC: G03F7/20 ,  G03F7/038 ,  G03F7/029 ,  B41C1/10 ,  C08F220/14 ,  G03F7/32

Abstract: A negative type photosensitive resin composition includes a polymer compound which has, in a main chain thereof, a constitutional unit A represented by Formula A-1, a constitutional unit B that is at least one of constitutional units represented by Formulae B-1, B-2, B-3, B-4, B-5, B-6, or B-7, and a constitutional unit C containing an ethylenically unsaturated group; and a polymerization initiator. A negative type planographic printing plate precursor includes an image recording layer containing the negative type photosensitive resin composition. A method of preparing a planographic printing plate includes, in order, an exposure step of image-exposing the negative type planographic printing plate precursor; and a development step of performing development by removing a non-exposed portion of the exposed negative type planographic printing plate precursor using a developer.

公开(公告)号：US11590751B2

公开(公告)日：2023-02-28

申请号：US16695206

申请日：2019-11-26

Applicant: FUJIFILM Corporation

Inventor： Shuji Hirano ,  Atsuyasu Nozaki

IPC: B41C1/10

Abstract: A lithographic printing plate precursor has an image-recording layer on a hydrophilic support, wherein the image-recording layer includes a polymer particle including an addition polymerization resin having a hydrophilic structure and a crosslinking structure. A method for producing a lithographic printing plate uses the lithographic printing plate precursor. A polymer particle includes an addition polymerization resin having a hydrophilic structure and a crosslinking structure. A composition includes the polymer particle.

公开(公告)号：US10564545B2

公开(公告)日：2020-02-18

申请号：US15278715

申请日：2016-09-28

Applicant: FUJIFILM Corporation

Inventor： Rena Mukaiyama ,  Atsuyasu Nozaki ,  Takashi Sato ,  Kotaro Asano

IPC: G03F7/32 ,  G03F7/039 ,  B41C1/10 ,  G03F7/09 ,  G03F7/20

Abstract: A photosensitive resin composition contains a polymer compound having a linking group represented by Formula A-1 in the main chain; and an infrared absorbing material. In Formula A-1, R1 and R2 each independently represent a hydrogen atom or a monovalent organic group, and X1 is a specific linking group.

公开(公告)号：US10437149B2

公开(公告)日：2019-10-08

申请号：US15655887

申请日：2017-07-21

Applicant: FUJIFILM CORPORATION

Inventor： Atsuyasu Nozaki

IPC: G03F7/20 ,  G03F7/039 ,  C08G64/12 ,  C08G18/32 ,  C08G73/14 ,  G03F7/095 ,  B41C1/10 ,  B41N1/14 ,  C08G18/28 ,  C08G18/73 ,  C08G75/30 ,  G03F7/004 ,  G03F7/11

Abstract: Provided is a photosensitive resin composition, including: a polymer compound which has a polycyclic structure and a sulfonamide group in a main chain thereof; and an infrared absorbent, wherein the polycyclic structure has at least one structure selected from the group consisting of a fused cyclic hydrocarbon structure and a fused polycyclic aromatic structure.

公开(公告)号：US10363733B2

公开(公告)日：2019-07-30

申请号：US15448570

申请日：2017-03-02

Applicant: FUJIFILM CORPORATION

Inventor： Atsuyasu Nozaki ,  Takashi Sato ,  Rena Mukaiyama

IPC: G03F7/32 ,  B41C1/10 ,  G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/095 ,  B41N1/14 ,  C08G73/02 ,  G03F7/11 ,  G03F7/20

Abstract: Provided are a photosensitive resin composition which enables production of a lithographic printing plate precursor having a non-image portion which has good solubility in an alkali aqueous solution and which enables production of a lithographic printing plate having excellent chemical resistance and excellent printing durability, a lithographic printing plate precursor obtained by using the photosensitive resin composition, a method for producing a lithographic printing plate, and a new polymer compound. The photosensitive resin composition of the present invention contains: a polymer compound which has an amine bond or a quaternary ammonium salt bond, and at least one bond selected from the group consisting of a urea bond, a urethane bond, and a carbonate bond in the main chain and has a sulfonamide group or a phenolic hydroxyl group in the main chain and/or the side chain; and an infrared absorbing material.

公开(公告)号：US11567404B2

公开(公告)日：2023-01-31

申请号：US16706809

申请日：2019-12-08

Applicant: FUJIFILM Corporation

Inventor： Atsuyasu Nozaki ,  Kenjiro Araki

IPC: G03F7/033 ,  B41C1/10 ,  C08G18/10 ,  C08G18/48 ,  C08G18/76 ,  G03F7/029 ,  G03F7/16 ,  G03F7/20 ,  G03F7/30 ,  G03F7/32

Abstract: A lithographic printing plate precursor having an image-recording layer on a hydrophilic support, in which the image-recording layer includes an organic polymer particle, and the organic polymer particle is a reaction product obtained by at least reacting an aromatic polyvalent isocyanate compound having a structure represented by Formula PO and water, a method for making a lithographic printing plate having excellent printing resistance in the case of using an ultraviolet-curable ink in printing, a new organic polymer particle, and a resin composition including the organic polymer particle.

公开(公告)号：US10338469B2

公开(公告)日：2019-07-02

申请号：US15279699

申请日：2016-09-29

Applicant: FUJIFILM Corporation

Inventor： Kotaro Asano ,  Atsuyasu Nozaki ,  Takashi Sato ,  Rena Mukaiyama ,  Kazuto Shimada

IPC: G03F7/32 ,  G03F7/039 ,  B41C1/10 ,  G03F7/20 ,  G03F7/095

Abstract: A photosensitive resin composition contains a polymer compound having a constitutional unit represented by the following Formula A-1 as a constitutional unit A and at least one constitutional unit among constitutional units represented by the following Formulas B-1 to B-6 as a constitutional unit B in the main chain, and an infrared absorbing material.

公开(公告)号：US09470974B2

公开(公告)日：2016-10-18

申请号：US14176787

申请日：2014-02-10

Applicant: FUJIFILM Corporation

Inventor： Yuzo Nagata ,  Hiroaki Idei ,  Atsuyasu Nozaki ,  Kenta Ushijima ,  Yushi Kaneko ,  Yousuke Murakami

IPC: G02B5/20 ,  G03F7/028 ,  G03F7/031 ,  G03F7/038 ,  G03F7/00 ,  G02B5/22 ,  C09B69/10 ,  C09D143/04 ,  C08F220/34 ,  C08F220/38

CPC classification number: G03F7/0007 ,  C08F220/34 ,  C08F220/38 ,  C08L2312/00 ,  C09B69/109 ,  C09D143/04 ,  G02B5/22 ,  G02B5/223 ,  G03F7/028 ,  G03F7/031 ,  G03F7/0388

Abstract: Disclosed is a coloring composition with satisfactory heat resistance, no discoloration, excellent developability, and no development residues on a substrate and pixels of other colors, providing, a coloring composition for a color filter including (A) a polymer having a dye skeleton and (B) an organic solvent, wherein the content of an unreacted monomer component having the dye skeleton which is capable of forming (A) the polymer having the dye skeleton is less than or equal to 1 mass % with regard to (A) the polymer having the dye skeleton.

Abstract translation: 公开了一种着色组合物，其具有令人满意的耐热性，不变色，优异的显影性，并且在基材和其他颜色的像素上没有显影残留，提供了一种滤色器用着色组合物，其包括（A）具有染料骨架的聚合物和（ B）有机溶剂，其中具有染料骨架的能够形成（A）具有染料骨架的聚合物的未反应单体组分的含量相对于（A）具有（A）具有染料骨架的聚合物的含量小于或等于1质量％ 染色骨架。